Deposition and etching of amorphous carbon films in ecr plasma 離子體沉積和刻蝕非晶碳薄膜
Preparation and friction properties of aligned membrane of amorphous carbon nanorods on aao template 模板上碳納米棒定向膜的制備及摩擦性能分析
Super - hard amorphous carbon films were deposited on such substrates as single - crystalline silicon and k9 glass by pulse laser ablating graphite target 本文研究用脈沖激光燒蝕石墨靶方法在單晶硅、 k9玻璃等襯底上生長(zhǎng)超硬非晶碳膜。
The method of amino ? roup doping into hydrogenated amorphous carbon ( ct - c : h ) film and the influence of technological condition on it had been exhaustedly discussed in the article 本文詳細(xì)研究了對(duì)氫化碳膜進(jìn)行胺基團(tuán)摻雜的方法,工藝條件。
As an environmentally benign and economically viable optoelectronic device material , amorphous carbon ( a - c ) films are of interests in various applications 作為一種經(jīng)濟(jì)適用并且環(huán)境友好的光電器件材料,非晶碳薄膜因其眾多優(yōu)良的特性而引起廣泛研究興趣。
It is thought that the emission process happened with the participation of diamond crystal , graphite , amorphous carbon and intra - face states in the diamond films 認(rèn)為非晶碳、石墨、金剛石及相應(yīng)界面態(tài)構(gòu)成一個(gè)完整的體系參與場(chǎng)發(fā)射,金剛石薄膜中雜相的存在有利于電子的場(chǎng)發(fā)射。
The results show that amorphous carbon films have high etching resistance against oxygen plasma , and etch rates of the films correlated not only with etching processing parameters , also with deposition conditions 結(jié)果表明非晶碳膜對(duì)于氧離子體具有高的抗刻蝕性,其刻蝕率不僅與刻蝕的過(guò)程參量有關(guān),而且決定于膜的沉積條件。
Ion - assisted bombardment and direct current bias were emphasized in charter ii and charter iii respectively on studying how external factor as an assisted avenue can influence the growth of amorphous carbon film 第二章和第三章分別從引入離子轟擊和施加直流偏壓電場(chǎng)兩方面著重研究了外界條件作為輔助手段對(duì)非晶碳生長(zhǎng)的影響。
These amorphous carbon tubes are totally different from those graphitized carbon nanotubes obtained through traditional methods . the simple and direct synthesis method is superior to the usual casting method by mesoporous silica materials 相對(duì)于利用中孔sio _ 2為模板合成的中孔碳材料,我們的合成方法更簡(jiǎn)單直接,并且如此大孔徑的有序中孔碳材料也是首次報(bào)道。
Consisted mainly of amorphous phase . hrem images showed that the ti - dlc film had a lamellar structure . the tic phase with a size of 5 nm was located at the titanium - rich regions surrounded by amorphous carbon structures in the ti - dlc film Ti - dlc膜的結(jié)構(gòu)主要為非晶相,高分辨電子顯微鏡分析( hrem )表明ti - dlc膜成層狀分布,膜內(nèi)存在著富ti區(qū)和貧ti區(qū), tic顆粒尺寸大約為5nm 。
Amorphous carbon is free, reactive carbon that does not have any crystalline structure (also called diamond-like carbon). Amorphous carbon materials may be stabilized by terminating dangling-π bonds with hydrogen.